Polishing Technology CMP Conditioner
Patent obtained, Patent No. 4441552.
We are launching a diamond conditioner with a double-layer structure, contributing to significant cost reduction.
- 企業:メゾテクダイヤ
- 価格:Other
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Patent obtained, Patent No. 4441552.
We are launching a diamond conditioner with a double-layer structure, contributing to significant cost reduction.