Polishing Technology CMP Conditioner
Patent obtained, Patent No. 4441552.
We are launching a diamond conditioner with a double-layer structure, contributing to significant cost reduction.
- Company:メゾテクダイヤ
- Price:Other
1~1 item / All 1 items
Patent obtained, Patent No. 4441552.
We are launching a diamond conditioner with a double-layer structure, contributing to significant cost reduction.